LIGHT SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT

PROBLEM TO BE SOLVED: To provide optimization of a light source suitable for image fidelity and throughput. SOLUTION: This method is used for optimizing a light source to generate a desired feature pattern on a wafer by photolithography processing. The method includes steps of: receiving at least a...

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1. Verfasser:	GRANIK YURI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide optimization of a light source suitable for image fidelity and throughput. SOLUTION: This method is used for optimizing a light source to generate a desired feature pattern on a wafer by photolithography processing. The method includes steps of: receiving at least a part of a layout database to select the desired feature pattern to be generated on a wafer; associating a plurality of pixel densities in the light source and contribution of pixels of the light source to one point on the wafer with the desired feature pattern by using a mathematical relationship; and determining the pixel density of the light source by using the mathematical relationship so that an error between a feature pattern generated on the wafer and the desired feature pattern is minimized at simultaneous irradiation of the pixels at a predetermined pixel density. COPYRIGHT: (C)2011,JPO&INPIT