LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to re...

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Hauptverfasser: MIRANDA MARCIO ALEXANDRE CANO, JACOBS JOHANNES HENRICUS WILHELMUS, KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA, LAURENT THIBAULT SIMON MATHIEU, PATEL HRISHIKESH, FENG PENG, KUNNEN JOHAN GERTRUDIS CORNELIS, BLOKS RUUD HENDRICUS MARTINUS JOHANNES
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT