STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To prevent the infiltration of a liquid between a substrate and a holder even when the liquid is filled in between a projection optical system and the substrate to perform an exposure processing. SOLUTION: A stage apparatus moves while holding a substrate P to be exposed throug...

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Bibliographische Detailangaben
Hauptverfasser:	KONO HIROTAKA, SHIRAISHI KENICHI, NISHII YASUFUMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To prevent the infiltration of a liquid between a substrate and a holder even when the liquid is filled in between a projection optical system and the substrate to perform an exposure processing. SOLUTION: A stage apparatus moves while holding a substrate P to be exposed through a liquid 1 and includes: a plurality of support parts 34 supporting the substrate P; and a circumferential member 30 provided around the plurality of support parts 34 to form a gap between the circumferential member 30 itself and a side surface of the substrate P supported by the plurality of support parts 34. The circumferential member 30 includes: a channel 62 opened to a side surface portion of the circumferential member; and an inclined surface 5 inclined toward the channel 62 from the gap. COPYRIGHT: (C)2011,JPO&INPIT