SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To omit a mechanism rotating a substrate, when transferring it between processing chambers, and to prevent an substrate processing apparatus from increasing in size, in the substrate processing apparatus having a plurality of processing chambers where the substrate placed on a tray and transfer is processed. SOLUTION: In the substrate processing apparatus constituted of: a first tray transfer mechanism for transferring the tray, along a first linear direction toward from a first vacuum chamber to a second vacuum chamber; and a second tray transfer mechanism for transferring the tray along a second linear direction toward from the first vacuum chamber to a third vacuum chamber, the constitution of the vacuum chamber side of the second transferring mechanism of the first vacuum chamber is evacuated from a transfer level so that the tray is transferred along the first linear direction, between the first vacuum chamber and the second vacuum chamber, and the constitution of the vacuum chamber side of the first tray transfer mechanism of the first vacuum chamber is evacuated from the transfer level so that the tray is transferred, along the second linear direction between the first vacuum chamber and the third vacuum chamber. COPYRIGHT: (C)2011,JPO&INPIT