METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RETICLE, AND SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To efficiently conduct inspection of a transfer pattern where a specific semiconductor element pattern of a reticle is exposed by finding out the specific semiconductor element pattern on a semiconductor substrate easily and correctly in a short time, even if there are many semiconductor element patterns of the reticle. SOLUTION: By using a reticle 11 having a plurality of semiconductor element patterns 12, and a pattern 13 for identification which indicates the direction and distance from the semiconductor element pattern 12 to at least one of the plurality of semiconductor element patterns 12 to be observed, i.e., the specific semiconductor element pattern 12A, a photoresist on a semiconductor substrate is exposed and the transfer pattern of the specific semiconductor element pattern 12A is inspected using the transfer pattern of the pattern 13 for identification. COPYRIGHT: (C)2011,JPO&INPIT