METHOD OF MANUFACTURING SOLID-STATE IMAGE SENSOR

PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid-state image sensor that can prevent reliability degradation and deterioration of optical characteristics. SOLUTION: The method of manufacturing the solid-state image sensor having a photoelectric conversion element 12 formed on a substrate includes an in-layer lens formation step for forming an in-layer lens of a lower convex shape over the photoelectric conversion element 12. The in-layer lens formation step includes the steps of: forming over the substrate an interlayer insulating film 17 having a concave portion on the photoelectric conversion element 12; forming a film 18 of a first lens material constituting the in-layer lens on the interlayer insulating film 17; shaving the film 18 of the first lens material by sputter etching to prevent the occurrence of an air gap in the film 18 of the first lens material; performing at least either oxygen plasma processing or thermal processing after the sputter etching to reform the surface of the film 18 of the first lens material; and forming a film 19 of a second lens material on the film 18 of the first lens material after the reforming. COPYRIGHT: (C)2011,JPO&INPIT