FILM OBTAINED BY MOLDING ACRYLIC-MODIFIED URETHANE-UREA RESIN COMPOSITION

PROBLEM TO BE SOLVED: To provide a film that achieves both excellent solvent resistance and heat resistance in a level which does not cause dissolution, deformation and discoloration or the like of the molding surface even when various solvents are attached. SOLUTION: The film is obtained by molding...

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Bibliographische Detailangaben
Hauptverfasser: IMANAKA MASAYOSHI, OBI KAZUKI, TANAKA KOJIRO, YAMAMOTO TATSUYA, SUGAYA EIJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film that achieves both excellent solvent resistance and heat resistance in a level which does not cause dissolution, deformation and discoloration or the like of the molding surface even when various solvents are attached. SOLUTION: The film is obtained by molding an acrylic-modified urethane-urea resin composition containing an acrylic-modified urethane-urea resin (1) obtained by reacting an alicyclic structure-containing polyol (A), an alicyclic structure-containing polyisocyanate (B), an alicyclic structure-containing polyamine (C) and an acrylic compound (D) having an active hydrogen atom, and a solvent (2), wherein the alicyclic structure-containing polyol (A) is in the range of 40-80 mass% to the sum mass of the (A), (B), (C) and (D). COPYRIGHT: (C)2011,JPO&INPIT