APPARATUS FOR FABRICATING THIN FILM TRANSISTOR

PROBLEM TO BE SOLVED: To provide an apparatus for fabricating a thin film transistor that can decrease the total number of process chambers. SOLUTION: The apparatus for fabricating a thin film transistor includes a first multi-chamber in which amorphous silicon is deposited on a substrate, a second...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AN SHISHU, KIM BEONG-JU, KIN SEITETSU, YU CHEOL-HO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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