CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, CHARGED PARTICLE BEAM LITHOGRAPHY METHOD, AND SUBSTRATE HOLDER
PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of attaching a substrate holder to a wafer substrate and conveying them while suppressing production of particles. SOLUTION: The charged particle beam lithography apparatus 100 includes the substrate holder 20 whi...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of attaching a substrate holder to a wafer substrate and conveying them while suppressing production of particles. SOLUTION: The charged particle beam lithography apparatus 100 includes the substrate holder 20 which has a plurality of plate members and uses the plurality of plate members to hold the wafer substrate therebetween without fixing it, a lithography chamber 103 in which the substrate holder is carried in the state wherein the wafer substrate is held without being fixed, a support pin 106 which holds a lower surface of the substrate holder carried in the lithography chamber, and can be elevated, a stationary block member 108 which comes into contact with an upper surface of the substrate holder as the support pin 106 is elevated to stop a holding portion from moving up, and fixes the wafer substrate in the substrate holder with pressing force of the holding portion from below and repulsion against the pressing force, and a lithography portion 150 which draws a pattern on the wafer substrate, fixed in the substrate holder with the support pin 106 and stationary block member 108, using an electron beam. COPYRIGHT: (C)2011,JPO&INPIT |
---|