ION BEAM IRRADIATION DEVICE

PROBLEM TO BE SOLVED: To suppress irradiation of light emitted from a plasma source on a processed object and photograph stably a processing point of the processed object. SOLUTION: A camera 4 photographs the processing point P of the processing object W on which ion beams I are irradiated. An ion g...

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Bibliographische Detailangaben
Hauptverfasser: SAITO TETSUO, KAMAIKE YASUSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To suppress irradiation of light emitted from a plasma source on a processed object and photograph stably a processing point of the processed object. SOLUTION: A camera 4 photographs the processing point P of the processing object W on which ion beams I are irradiated. An ion gun 2 has a plasma source 21 to generate plasma and an extraction electrode 22 to extract ion beams I from the plasma source 21. Furthermore, the ion gun 2 has an ion deflection part 23 which deflects ion beams I out of the ion beam I extracted from the plasma source 21 to the extraction electrode 22 and light emitted together with the ion beams I from the plasma source 21, in the direction of the processed object W. The ion deflection part 23 shields light emitted from the plasma source 21 and suppresses leakage of light from a housing 27. COPYRIGHT: (C)2011,JPO&INPIT