EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD OF MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

PROBLEM TO BE SOLVED: To accurately draw a pattern by uniforming an exposure amount when the pattern is drawn on the substrate by a light beam. SOLUTION: A light quantity data memory 82 of an exposure pattern analyzer 80 previously stores the quantity of the light beam radiated from a light beam rad...

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1. Verfasser:	MOCHIZUKI MASAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:	PROBLEM TO BE SOLVED: To accurately draw a pattern by uniforming an exposure amount when the pattern is drawn on the substrate by a light beam. SOLUTION: A light quantity data memory 82 of an exposure pattern analyzer 80 previously stores the quantity of the light beam radiated from a light beam radiation device 20 for each exposure region of a predetermined area. A drawing control section 71 supplies drawing data to a DMD driving circuit 27 of the light beam radiation device 20. An exposure counter 85 counts the number of radiations of the light beam for each exposure region of the predetermined area based on: the relative position of a chuck 10 and the light beam radiation device 20; and the drawing data supplied to the DMD driving circuit 27 of the light beam radiation device 20. An arithmetic circuit 87 calculates the exposure amount for each exposure region of the predetermined area based on: the previously stored quantity of the light beam; and the number of radiations of the light beam. The exposure pattern analyzer 80 corrects the exposure amount based on the calculated exposure amount. COPYRIGHT: (C)2011,JPO&INPIT