WINDOW GLASS FOR VEHICLE AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a window glass for vehicles excellent in friction resistance. SOLUTION: Gas of organosilicon compound is introduced into a vacuum vessel 20, at the same time, vapor of SiO2is released from a vapor deposition source 21 and a protective film made of silicon oxide thin...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	KURAUCHI TOSHIHARU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS REMOVABLE EXTERNAL PROTECTIVE COVERINGS SPECIALLY ADAPTED FORVEHICLES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING VEHICLES IN GENERAL WINDOWS, WINDSCREENS, NON-FIXED ROOFS, DOORS, OR SIMILARDEVICES FOR VEHICLES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a window glass for vehicles excellent in friction resistance. SOLUTION: Gas of organosilicon compound is introduced into a vacuum vessel 20, at the same time, vapor of SiO2is released from a vapor deposition source 21 and a protective film made of silicon oxide thin film containing carbon is formed on the surface of a PC substrate 25. The protective film has high abrasion resistance and has small haze value. When the protective film is formed while applying an AC voltage to a substrate holder 23 which retains the PC substrate 25, the abrasion resistance and adhesiveness are enhanced. Further, gas of carbonized silicon compound introduced into the vacuum vessel 20 is turned into plasma and, thereby, the protective film can be formed. COPYRIGHT: (C)2011,JPO&INPIT