ALKALI-SOLUBLE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition such as a colored ink for a color filter capable of forming very thin lines even with a high pigment concentration, having high adhesion, giving a good pattern profile, and contributing to higher definition, a higher yield and a sho...

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Hauptverfasser:	KIBINAGA HIDEHIKO, FUJISHIRO KOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive resin composition such as a colored ink for a color filter capable of forming very thin lines even with a high pigment concentration, having high adhesion, giving a good pattern profile, and contributing to higher definition, a higher yield and a shorter takt time. SOLUTION: An alkali-soluble resin (A) is obtained by reacting a carboxyl group-containing polymer represented by general formula (I) with a carboxylic acid reactive compound which has a group reacting with carboxylic acid and an ethylenically unsaturated group or a group reacting with carboxylic acid and a silicon functional group. The photosensitive resin composition comprises the alkali-soluble resin (A). In general formula (I), R1, R2, R3, and R4are each independently hydrogen, 1-5C alkyl, halogen or phenyl; R5is hydrogen or methyl; A is a 9,9-fluorenyl; X is a tetravalent carboxylic acid residue; Y1and Y2are each independently hydrogen or carboxylic acid residue represented by -OC-Z-(COOH)m where m is a number of 1-3; and n is a number of 1-20. COPYRIGHT: (C)2011,JPO&INPIT