LITHOGRAPHY APPARATUS, REMOVABLE MEMBER, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a sealing member that does not have a large couple of force or a time-related couple of force in particular between sections of an immersion lithography apparatus for forming a sealed gap. SOLUTION: The sealing member that prevents the entry of an immersion liquid in...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, ANTONIUS LEENDERS MARTINUS HENDRIKUS, DE ROOIJ GERARDUS MARTINUS ANTONIUS, BADAM VIJAY KUMAR, DE KRUIJF NIEK ELOUT, SONDAG-HUETHORST JOHANNA ANTOINETTE MARIA, DE GRAAF ROELOF FREDERIK, VAN DE KERKHOF MARCUS A, DZIOMKINA NINA VLADIMIROVNA, HOUBEN MARTIJN
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL PAINTS POLISHES SEMICONDUCTOR DEVICES USE OF MATERIALS AS ADHESIVES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a sealing member that does not have a large couple of force or a time-related couple of force in particular between sections of an immersion lithography apparatus for forming a sealed gap. SOLUTION: The sealing member that prevents the entry of an immersion liquid into a gap between components is provided. The sealing member has a plastic or polymeric sealing section adhered to components for forming a sealed gap. The sealing member is structured to reduce a couple of force or a time-related couple of force in particular between sealed components. COPYRIGHT: (C)2011,JPO&INPIT