METHOD AND DEVICE FOR MANUFACTURING PELLICLE FILM

PROBLEM TO BE SOLVED: To provide a method for manufacturing a pellicle film, the method forming a pellicle film having a uniform film thickness, which is a pellicle film used for a pellicle for lithography. SOLUTION: The method for manufacturing a pellicle film is described as follows: a temperature of a substrate 5 is controlled so that an in-plane temperature distribution of the substrate 5 has a concentrically circular shape; a solution 30 containing a pellicle film material is dropped onto the center part of the substrate 5, and the substrate 5 is rotated by a spin coating device; the solution 30 dropped onto the center part of the substrate 5 spreads on the substrate 5 by a centrifugal force to form a coating film on the substrate 5; a volatile component in the solution 30 is vaporized; and thereby the pellicle film used for a pellicle for lithography is formed on the substrate 5. COPYRIGHT: (C)2011,JPO&INPIT