METHOD FOR PREPARING PATTERNING BASE MATERIAL

PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which...

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Hauptverfasser: NISHIKAWA YOHEI, SEKINE NORIMASA, TAMAKOSHI MAMORU
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creator NISHIKAWA YOHEI
SEKINE NORIMASA
TAMAKOSHI MAMORU
description PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which is developed instead of a photolithography method having problems of process complication and an increase of an equipment scale. SOLUTION: In a method for preparing a layered structural pattern constituted of at least two layers including a pattern upper layer part and a lower layer part on a base material, the pattern upper layer part is larger than the pattern layer on the lower side thereof and a pattern surface part made of the image pattern upper layer part is protruded in a horizontal direction in a pattern sectional shape. COPYRIGHT: (C)2011,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2011099957A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2011099957A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2011099957A3</originalsourceid><addsrcrecordid>eNrjZND1dQ3x8HdRcPMPUggIcg1wDPL0c1cIcAwJcQ3yAzGdHINdFXwdgVxPRx8eBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGhoYGlpaWruaEyUIgAGQSX0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PREPARING PATTERNING BASE MATERIAL</title><source>esp@cenet</source><creator>NISHIKAWA YOHEI ; SEKINE NORIMASA ; TAMAKOSHI MAMORU</creator><creatorcontrib>NISHIKAWA YOHEI ; SEKINE NORIMASA ; TAMAKOSHI MAMORU</creatorcontrib><description>PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which is developed instead of a photolithography method having problems of process complication and an increase of an equipment scale. SOLUTION: In a method for preparing a layered structural pattern constituted of at least two layers including a pattern upper layer part and a lower layer part on a base material, the pattern upper layer part is larger than the pattern layer on the lower side thereof and a pattern surface part made of the image pattern upper layer part is protruded in a horizontal direction in a pattern sectional shape. COPYRIGHT: (C)2011,JPO&amp;INPIT</description><language>eng</language><subject>COLOUR PRINTING ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; FREQUENCY-CHANGING ; LINING MACHINES ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; PERFORMING OPERATIONS ; PHYSICS ; PRINTING ; PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES ; STAMPS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110519&amp;DB=EPODOC&amp;CC=JP&amp;NR=2011099957A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110519&amp;DB=EPODOC&amp;CC=JP&amp;NR=2011099957A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHIKAWA YOHEI</creatorcontrib><creatorcontrib>SEKINE NORIMASA</creatorcontrib><creatorcontrib>TAMAKOSHI MAMORU</creatorcontrib><title>METHOD FOR PREPARING PATTERNING BASE MATERIAL</title><description>PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which is developed instead of a photolithography method having problems of process complication and an increase of an equipment scale. SOLUTION: In a method for preparing a layered structural pattern constituted of at least two layers including a pattern upper layer part and a lower layer part on a base material, the pattern upper layer part is larger than the pattern layer on the lower side thereof and a pattern surface part made of the image pattern upper layer part is protruded in a horizontal direction in a pattern sectional shape. COPYRIGHT: (C)2011,JPO&amp;INPIT</description><subject>COLOUR PRINTING</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>FREQUENCY-CHANGING</subject><subject>LINING MACHINES</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>PRINTING</subject><subject>PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES</subject><subject>STAMPS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND1dQ3x8HdRcPMPUggIcg1wDPL0c1cIcAwJcQ3yAzGdHINdFXwdgVxPRx8eBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGhoYGlpaWruaEyUIgAGQSX0</recordid><startdate>20110519</startdate><enddate>20110519</enddate><creator>NISHIKAWA YOHEI</creator><creator>SEKINE NORIMASA</creator><creator>TAMAKOSHI MAMORU</creator><scope>EVB</scope></search><sort><creationdate>20110519</creationdate><title>METHOD FOR PREPARING PATTERNING BASE MATERIAL</title><author>NISHIKAWA YOHEI ; SEKINE NORIMASA ; TAMAKOSHI MAMORU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2011099957A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>COLOUR PRINTING</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>FREQUENCY-CHANGING</topic><topic>LINING MACHINES</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>PRINTING</topic><topic>PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES</topic><topic>STAMPS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHIKAWA YOHEI</creatorcontrib><creatorcontrib>SEKINE NORIMASA</creatorcontrib><creatorcontrib>TAMAKOSHI MAMORU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHIKAWA YOHEI</au><au>SEKINE NORIMASA</au><au>TAMAKOSHI MAMORU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PREPARING PATTERNING BASE MATERIAL</title><date>2011-05-19</date><risdate>2011</risdate><abstract>PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which is developed instead of a photolithography method having problems of process complication and an increase of an equipment scale. SOLUTION: In a method for preparing a layered structural pattern constituted of at least two layers including a pattern upper layer part and a lower layer part on a base material, the pattern upper layer part is larger than the pattern layer on the lower side thereof and a pattern surface part made of the image pattern upper layer part is protruded in a horizontal direction in a pattern sectional shape. COPYRIGHT: (C)2011,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects COLOUR PRINTING
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
FREQUENCY-CHANGING
LINING MACHINES
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
PERFORMING OPERATIONS
PHYSICS
PRINTING
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES
STAMPS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
TRANSPORTING
TYPEWRITERS
title METHOD FOR PREPARING PATTERNING BASE MATERIAL
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T01%3A35%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NISHIKAWA%20YOHEI&rft.date=2011-05-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2011099957A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true