METHOD FOR PREPARING PATTERNING BASE MATERIAL

PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIKAWA YOHEI, SEKINE NORIMASA, TAMAKOSHI MAMORU
Format:	Patent
Sprache:	eng
Schlagworte:	COLOUR PRINTING DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING LINING MACHINES NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To solve a request of fine working of high quality having high pattern superposition accuracy without omission due to deformation of a pattern with a simple process/equipment scale in a reverse printing method for transfer onto a surface of a base material to be printed, which is developed instead of a photolithography method having problems of process complication and an increase of an equipment scale. SOLUTION: In a method for preparing a layered structural pattern constituted of at least two layers including a pattern upper layer part and a lower layer part on a base material, the pattern upper layer part is larger than the pattern layer on the lower side thereof and a pattern surface part made of the image pattern upper layer part is protruded in a horizontal direction in a pattern sectional shape. COPYRIGHT: (C)2011,JPO&INPIT