LITHOGRAPHIC PROJECTION APPARATUS

PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confin...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, MONDT EVA, STEFFENS KOEN, RIEPEN MICHEL, BERKVENS PAUL PETRUS JOANNES, BRANDS GERT-JAN GERARDUS JOHANEES THOMAS, CHRISTIAAN ALEXANDER HOOGENDAM, SIMONS WILHELMUS FRANCISCUS JOHANNES, DIREKS DANIEL JOSEPH MARIA, LEMPENS HAN HENRICUS ALDEGONDA, VAN DER HAM RONALD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confinement system and a substrate is substantially nailed in a prescribed position by a meniscus nailing form is disclosed. The meniscus nailing form has a plurality of discrete outlets arranged in a polygon. COPYRIGHT: (C)2011,JPO&INPIT