PHOTOCURABLE LOW SHRINKAGE MONOMER COMPOUND

PROBLEM TO BE SOLVED: To provide a (meth)acrylic monomer compound reduced in volumetric shrinkage occurring in photo-curing. SOLUTION: The (meth)acrylic monomer compound includes at least one amide methylol structural moiety consisting of -CO-NH-CH2-O- in the molecule. In particular, a 5-99C monomer...

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Bibliographische Detailangaben
Hauptverfasser: YOSHIOKA NAHO, MATSUOKA KAZUYOSHI, AKAISHI RYOICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a (meth)acrylic monomer compound reduced in volumetric shrinkage occurring in photo-curing. SOLUTION: The (meth)acrylic monomer compound includes at least one amide methylol structural moiety consisting of -CO-NH-CH2-O- in the molecule. In particular, a 5-99C monomer compound is preferable. COPYRIGHT: (C)2011,JPO&INPIT