SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of manufacturing the same which can prevent peeling and cracks of a passivation film. SOLUTION: A semiconductor chip 1 is formed in a rectangular shape in plane view, and includes a groove 11 on a peripheral edge part of an outermo...

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Bibliographische Detailangaben
Hauptverfasser: HIKITA JUNICHI, KASAI MASAKI, MIYATA OSAMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of manufacturing the same which can prevent peeling and cracks of a passivation film. SOLUTION: A semiconductor chip 1 is formed in a rectangular shape in plane view, and includes a groove 11 on a peripheral edge part of an outermost surface. The passivation film 2 is formed so as to cover an entire surface of the semiconductor chip 1 except for the groove 11. A stress relaxing layer 3, a rewiring 4, and a sealing resin layer 5 are formed on the passivation film 2. The sealing resin layer 5 covers up surfaces of the passivation film 2, the stress relaxing layer 3, and the rewiring 4, and in addition, wraps around a side surface from the surfaces of them to fill up the groove 11 of the semiconductor chip 1. COPYRIGHT: (C)2011,JPO&INPIT