VACUUM PROCESSOR, GRAPH LINE DISPLAY METHOD

PROBLEM TO BE SOLVED: To extract a portion of measurement values, and to easily compare graphed and extracted measurement values. SOLUTION: A lot of measurement values are read and displayed as a primary graph on a screen 100. Measurement values to be compared are extracted by specifying a start poi...

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Bibliographische Detailangaben
Hauptverfasser:	SARUWATARI JIRO, HIRAKI TSUTOMU, YAMANE KATSUMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING DIFFUSION TREATMENT OF METALLIC MATERIAL FUNCTIONAL ELEMENTS OF SUCH SYSTEMS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To extract a portion of measurement values, and to easily compare graphed and extracted measurement values. SOLUTION: A lot of measurement values are read and displayed as a primary graph on a screen 100. Measurement values to be compared are extracted by specifying a start point. The extracted measurement values are displayed in secondary graphs 134a and 134b. When the secondary graphs 134a and 134b are not overlapped, the amount of shift between the graphs 134a and 134b is measured by first and second measurement lines 101 and 102, and one of the shifted secondary graphs 134a and 134b is moved to be superimposed on the other one. COPYRIGHT: (C)2011,JPO&INPIT