VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD

PROBLEM TO BE SOLVED: To compare a plurality of graphs in an overlapped manner. SOLUTION: On a screen 100, when graph lines 132 of a plurality of measurement values of vacuum processing have different peaks, first and second measure lines 101 and 102 are aligned with the peak of the other graph line...

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Hauptverfasser: SARUWATARI JIRO, HIRAKI TSUTOMU, YAMANE KATSUMI
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creator SARUWATARI JIRO
HIRAKI TSUTOMU
YAMANE KATSUMI
description PROBLEM TO BE SOLVED: To compare a plurality of graphs in an overlapped manner. SOLUTION: On a screen 100, when graph lines 132 of a plurality of measurement values of vacuum processing have different peaks, first and second measure lines 101 and 102 are aligned with the peak of the other graph line 132, first and second time on an X axis where the first and the second measure lines 101 and 102 are located are displayed, the graph line 132 is selected and moved, the peak positions are aligned with each other, and the measurement values are compared. Thus, it is possible to correct the disturbance at a graph start point using noise, to achieve accurate comparison. It is possible to move the graph 132 while viewing a control signal or the shape of the graph line 132, thereby facilitating correction. COPYRIGHT: (C)2011,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2011090528A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2011090528A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2011090528A3</originalsourceid><addsrcrecordid>eNrjZNALc3QODfVVCAjyd3YNDvYPUnD0c1FwD3IM8FDw8fRzVXDxDA7wcYxU8HUN8fB34WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGhgaWBqZGFo7GRCkCACfWJhY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD</title><source>esp@cenet</source><creator>SARUWATARI JIRO ; HIRAKI TSUTOMU ; YAMANE KATSUMI</creator><creatorcontrib>SARUWATARI JIRO ; HIRAKI TSUTOMU ; YAMANE KATSUMI</creatorcontrib><description>PROBLEM TO BE SOLVED: To compare a plurality of graphs in an overlapped manner. SOLUTION: On a screen 100, when graph lines 132 of a plurality of measurement values of vacuum processing have different peaks, first and second measure lines 101 and 102 are aligned with the peak of the other graph line 132, first and second time on an X axis where the first and the second measure lines 101 and 102 are located are displayed, the graph line 132 is selected and moved, the peak positions are aligned with each other, and the measurement values are compared. Thus, it is possible to correct the disturbance at a graph start point using noise, to achieve accurate comparison. It is possible to move the graph 132 while viewing a control signal or the shape of the graph line 132, thereby facilitating correction. COPYRIGHT: (C)2011,JPO&amp;INPIT</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; PHYSICS ; REGULATING ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110506&amp;DB=EPODOC&amp;CC=JP&amp;NR=2011090528A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110506&amp;DB=EPODOC&amp;CC=JP&amp;NR=2011090528A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SARUWATARI JIRO</creatorcontrib><creatorcontrib>HIRAKI TSUTOMU</creatorcontrib><creatorcontrib>YAMANE KATSUMI</creatorcontrib><title>VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD</title><description>PROBLEM TO BE SOLVED: To compare a plurality of graphs in an overlapped manner. SOLUTION: On a screen 100, when graph lines 132 of a plurality of measurement values of vacuum processing have different peaks, first and second measure lines 101 and 102 are aligned with the peak of the other graph line 132, first and second time on an X axis where the first and the second measure lines 101 and 102 are located are displayed, the graph line 132 is selected and moved, the peak positions are aligned with each other, and the measurement values are compared. Thus, it is possible to correct the disturbance at a graph start point using noise, to achieve accurate comparison. It is possible to move the graph 132 while viewing a control signal or the shape of the graph line 132, thereby facilitating correction. COPYRIGHT: (C)2011,JPO&amp;INPIT</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNALc3QODfVVCAjyd3YNDvYPUnD0c1FwD3IM8FDw8fRzVXDxDA7wcYxU8HUN8fB34WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGhgaWBqZGFo7GRCkCACfWJhY</recordid><startdate>20110506</startdate><enddate>20110506</enddate><creator>SARUWATARI JIRO</creator><creator>HIRAKI TSUTOMU</creator><creator>YAMANE KATSUMI</creator><scope>EVB</scope></search><sort><creationdate>20110506</creationdate><title>VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD</title><author>SARUWATARI JIRO ; HIRAKI TSUTOMU ; YAMANE KATSUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2011090528A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SARUWATARI JIRO</creatorcontrib><creatorcontrib>HIRAKI TSUTOMU</creatorcontrib><creatorcontrib>YAMANE KATSUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SARUWATARI JIRO</au><au>HIRAKI TSUTOMU</au><au>YAMANE KATSUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD</title><date>2011-05-06</date><risdate>2011</risdate><abstract>PROBLEM TO BE SOLVED: To compare a plurality of graphs in an overlapped manner. SOLUTION: On a screen 100, when graph lines 132 of a plurality of measurement values of vacuum processing have different peaks, first and second measure lines 101 and 102 are aligned with the peak of the other graph line 132, first and second time on an X axis where the first and the second measure lines 101 and 102 are located are displayed, the graph line 132 is selected and moved, the peak positions are aligned with each other, and the measurement values are compared. Thus, it is possible to correct the disturbance at a graph start point using noise, to achieve accurate comparison. It is possible to move the graph 132 while viewing a control signal or the shape of the graph line 132, thereby facilitating correction. COPYRIGHT: (C)2011,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
DIFFUSION TREATMENT OF METALLIC MATERIAL
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title VACUUM PROCESSOR AND GRAPH LINE DISPLAY METHOD
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