RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, HIGH MOLECULAR COMPOUND, AND COMPOUND

PROBLEM TO BE SOLVED: To provide a high molecular compound used in a resist composition, to provide a compound useful as a monomer for the high molecular compound; to provide a resist composition having good lithography properties; and to provide a method for forming a resist pattern using the resis...

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Hauptverfasser:	MATSUMIYA YU, DAZAI NAOHIRO, SHIONO HIROHISA, HIRANO TOMOYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a high molecular compound used in a resist composition, to provide a compound useful as a monomer for the high molecular compound; to provide a resist composition having good lithography properties; and to provide a method for forming a resist pattern using the resist composition. SOLUTION: The resist composition is obtained by dissolving a base material component (A) whose solubility to an alkali developing solution changes by the action of an acid, an acid generator component (B) generating an acid by exposure, and a fluorine-containing high molecular compound (C) exhibiting degradability in an alkali developing solution, in an organic solvent (S). COPYRIGHT: (C)2011,JPO&INPIT