METAL OXIDE-METAL COMPOSITE SPUTTERING TARGET

PROBLEM TO BE SOLVED: To provide a metal oxide-metal composite sputtering target which has no abnormal discharge and cracks and is useful for the formation of a recording layer for an optical information recording medium, comprising a metal oxide and a metal. SOLUTION: Specifically disclosed is a co...

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Bibliographische Detailangaben
Hauptverfasser:	MATSUZAKI HITOSHI, TAKAGI KATSUHISA, JIKO NORIHIRO, TOKUHIRA MASAYA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COLOUR PRINTING DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LINING MACHINES METALLURGY PERFORMING OPERATIONS PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a metal oxide-metal composite sputtering target which has no abnormal discharge and cracks and is useful for the formation of a recording layer for an optical information recording medium, comprising a metal oxide and a metal. SOLUTION: Specifically disclosed is a composite sputtering target containing a metal oxide A and a metal B. By the sintering of raw material powder in which the maximum value of the circle-equivalent diameter of the metal oxide is low and grain size is regulated, the maximum value of the circle-equivalent diameter of the metal oxide A is controlled to 200 μm or less. The metal oxide A may be flocculated. COPYRIGHT: (C)2011,JPO&INPIT