PLASMA CVD SYSTEM

PROBLEM TO BE SOLVED: To provide a plasma CVD system in which the falling of a film and a damage to a base material are prevented, and further, a shielding member preventing the deposition of a film at the edge parts of a film deposition roll can be easily exchanged. SOLUTION: The CVD system 1 is provided with: a vacuum chamber 3; film deposition rolls 2 arranged at the inside of the vacuum chamber 3, and to which both the electrodes of a power source 4 are connected and also a sheet-shaped base material W as a film deposition object is wound on each of them; and shielding members 5 shielding the edge parts 9 of the film deposition rolls from plasma. Each shielding member 5 has a curved shape so as to meet the circumferential direction of the surface of the edge part 9 of each film deposition roll and is made of a member separated from the film deposition roll 2. Each shielding member 5 and film deposition roll 2 are arranged so as to have a fixed clearance 10, and their potentials are held so as to be the same each other. The sheet-shaped base material W can be inserted into the clearance 10, and it is set so as to be a distance with which the progress of plasma 11 to the edge part side of the film deposition roll 2 can be prevented. COPYRIGHT: (C)2011,JPO&INPIT