LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method and device which improve overlay accuracy without significantly damaging processing ability of a lithographic apparatus. SOLUTION: An alignment indicator on a substrate is inspected in exposure of a substrate for optimizing exposure conditions. When a substr...

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Bibliographische Detailangaben
Hauptverfasser:	GUI CHENG-QUN, JACOBUS BURGHOOM, GEORGE RICHARD ALEXANDER, PIETER WILLEM HERMAN DE JAGER, ROBBERT EDGAR VAN LEEUWEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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