LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method and device which improve overlay accuracy without significantly damaging processing ability of a lithographic apparatus. SOLUTION: An alignment indicator on a substrate is inspected in exposure of a substrate for optimizing exposure conditions. When a substrate 10 is subjected to exposure and scanning immediately below an alignment unit 15, each portion of the substrate passes through below a detector unit 16 and then passes through below an exposure unit 17. Consequently, when the information about position of straight line, orientation, and expansion measured by the detector unit 16 for each part of the substrate 10 can be transferred to the exposure unit 17, and the substrate is exposed while passing directly under the exposure unit 17, the exposure condition of the part of the substrate to be exposed can be optimized. COPYRIGHT: (C)2011,JPO&INPIT