PROCESS MODULE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF TRANSFERRING SUBSTRATE

PROCESS MODULE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF TRANSFERRING SUBSTRATE

PROBLEM TO BE SOLVED: To provide a process module capable of rapid transfer of substrates to contribute to improvement in throughput, a substrate processing apparatus including the same, and to provide a method of transferring the substrate in them. SOLUTION: The process module 15 includes a mount 1...

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Bibliographische Detailangaben
1. Verfasser: IIZUKA YOJI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a process module capable of rapid transfer of substrates to contribute to improvement in throughput, a substrate processing apparatus including the same, and to provide a method of transferring the substrate in them. SOLUTION: The process module 15 includes a mount 15S on which the substrate W is mounted and processing of the mounted substrate W takes place, and a substrate transfer mechanism 150 which can be individually located at a first position where the substrate is transferred to an external substrate conveyor 16 and a second position over the mount 15S and includes a plurality of substrate holders 15U, 15M and 15D each capable of holding the substrate. COPYRIGHT: (C)2011,JPO&INPIT