METHOD FOR DEPOSITING THIN FILM BY LASER ABLATION, TARGET FOR LASER ABLATION TO BE USED FOR THE METHOD, AND METHOD FOR PRODUCING TARGET FOR LASER ABLATION

PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by laser ablation, in which the thin film can be deposited satisfactorily efficiently while suppressing the intrusion of a droplet satisfactorily. SOLUTION: The method for depositing the thin film by laser ablation includes the ste...

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Hauptverfasser: TAKECHI AKIHIRO, AZUMA HIROZUMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by laser ablation, in which the thin film can be deposited satisfactorily efficiently while suppressing the intrusion of a droplet satisfactorily. SOLUTION: The method for depositing the thin film by laser ablation includes the steps of: irradiating a target 1 with laser beams to produce scattering particles (a); and sticking the scattering particles (a) onto the surface of a base material 5 to deposit the thin film on the surface of the base material. The target 1 includes a supporting substrate and a particle layer which is formed on the supporting substrate and composed of particles of an inorganic material. The average particle size of the particles of the inorganic material is 5 nm to 50 μm and the thickness of the particle layer is 1-200 μm. COPYRIGHT: (C)2011,JPO&INPIT