SUBSTRATE TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To improve uniformity in the in-plane temperature distribution of a substrate in a heat treatment apparatus by means of a microwave. SOLUTION: A substrate treatment apparatus is equipped with: a treatment chamber 201 to treat the substrate; a substrate supporter 5 to support th...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	OKUNO MASAHISA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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