EXPOSURE DEVICE, AND EXPOSURE METHOD

PROBLEM TO BE SOLVED: To uniformize a cumulative light quantity of each mirror line of a DMD, in an exposure device and an exposure method configured to perform exposure to a photosensitive workpiece while performing scanning in a main-scanning direction using a DMD with micromirrors arranged in a m...

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Bibliographische Detailangaben
Hauptverfasser:	SUGAWA SHIGETOSHI, MORIMOTO TATSURO, KOSAKA KOJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To uniformize a cumulative light quantity of each mirror line of a DMD, in an exposure device and an exposure method configured to perform exposure to a photosensitive workpiece while performing scanning in a main-scanning direction using a DMD with micromirrors arranged in a matrix. SOLUTION: A mirror selection map considering even a leakage light quantity around an exposure part is previously created in accordance with a drawing pattern of an image formed on a substrate 10, and a DMD 14 is controlled using such a mirror selection map. Thus, cumulative light quantities of respective pixel columns of the DMD 14 are set equal to one another. COPYRIGHT: (C)2011,JPO&INPIT