GENERATING METHOD, CREATING METHOD, EXPOSURE METHOD, AND PROGRAM

PROBLEM TO BE SOLVED: To provide a technique advantageous to generate data on patterns of a plurality of originals that are used in multiple exposure. SOLUTION: There is provided a generation method for generating by a computer, data of patterns of a plurality of originals for use in multiple exposu...

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1. Verfasser:	KAWASHIMA MIYOKO
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technique advantageous to generate data on patterns of a plurality of originals that are used in multiple exposure. SOLUTION: There is provided a generation method for generating by a computer, data of patterns of a plurality of originals for use in multiple exposure, in which a single-layer pattern is formed on a substrate by exposing the substrate a plurality number of times, in an exposure apparatus that includes an illumination optical system which illuminates an original with a light from a light source, and a projection optical system which projects a pattern of the original onto the substrate. COPYRIGHT: (C)2011,JPO&INPIT