PROCESS FOR PHOTOLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a new photoresist process, particularly suitable for immersion lithography. SOLUTION: The method for processing a photoresist composition includes: (a) applying on a substrate a photoresist composition; (b) subjecting the photoresist layer to immersion exposure to ra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG DEYAN, KANG DORIS, SPIZUOCO KENNETH J, ESTELLE THOMAS A, BARCLAY GEORGE G
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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