PROCESS FOR PHOTOLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a new photoresist process, particularly suitable for immersion lithography. SOLUTION: The method for processing a photoresist composition includes: (a) applying on a substrate a photoresist composition; (b) subjecting the photoresist layer to immersion exposure to ra...

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Bibliographische Detailangaben
Hauptverfasser:	WANG DEYAN, KANG DORIS, SPIZUOCO KENNETH J, ESTELLE THOMAS A, BARCLAY GEORGE G
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a new photoresist process, particularly suitable for immersion lithography. SOLUTION: The method for processing a photoresist composition includes: (a) applying on a substrate a photoresist composition; (b) subjecting the photoresist layer to immersion exposure to radiation activating for the photoresist composition; (c) adjusting a contact angle with water of the exposed photoresist layer; and (d) developing the processed photoresist layer to provide a photoresist relief image. COPYRIGHT: (C)2011,JPO&INPIT