EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To reduce the time required for replacing masks, while preventing a significant increase in the number of components or increase in the size. SOLUTION: While a first mask M1 is exposed, a first handler 11a picks up a second mask M2 to be used next from a mask storage section 6,...

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Bibliographische Detailangaben
1. Verfasser:	KIKUIRI HAJIME
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To reduce the time required for replacing masks, while preventing a significant increase in the number of components or increase in the size. SOLUTION: While a first mask M1 is exposed, a first handler 11a picks up a second mask M2 to be used next from a mask storage section 6, and places the mask on a pre-alignment stage 5 for pre-alignment. When exposure is finished, a second handler 12a carries the first mask M1 to the pre-alignment stage 5. A third handler 13a of a mask retracting mechanism 13 once receives the first mask M1 and holds the mask. The second handler 12a holds the second mask M2 and carries the mask to a mask stage 2. Simultaneously, the first handler receives the first mask M1 held by the third handler 13a, and collects the mask in the mask storage section 6. The mask retracting mechanism 13 is provided to retract a mask, thereby reducing the time required for replacing masks. COPYRIGHT: (C)2011,JPO&INPIT