DEVELOPER, ETCHING SOLUTION, AND METHOD OF MANUFACTURING MICROFABRICATED BODY

PROBLEM TO BE SOLVED: To provide a developer capable of preventing developing speed of an inorganic resist, and to provide a method of manufacturing a microfabricated body using the same. SOLUTION: The method of manufacturing the microfabricated body includes: a step of exposing an inorganic resist...

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Bibliographische Detailangaben
Hauptverfasser:	SAITO NORIYUKI, ADACHI NORIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a developer capable of preventing developing speed of an inorganic resist, and to provide a method of manufacturing a microfabricated body using the same. SOLUTION: The method of manufacturing the microfabricated body includes: a step of exposing an inorganic resist layer provided on a substrate; and a step of developing the exposed inorganic resist layer by the developer that contains an aqueous alkaline solution and amine. COPYRIGHT: (C)2011,JPO&INPIT