MASK FOR PRODUCING SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a mask that suppresses generation of foreign substances in an exposure process. SOLUTION: The mask for producing a semiconductor device includes a light-transmitting substrate, and a semi-light-shielding pattern and a light-shielding pattern formed on a part of the l...

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Bibliographische Detailangaben
Hauptverfasser:	AKUTSU HARUKO, OTSUBO KYO, KATANO MAKIKO, MIZUNO AYAKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a mask that suppresses generation of foreign substances in an exposure process. SOLUTION: The mask for producing a semiconductor device includes a light-transmitting substrate, and a semi-light-shielding pattern and a light-shielding pattern formed on a part of the light-transmitting substrate, wherein the concentration of an S-containing material is 0.4% or less within the range of a depth of 1 nm from the exposed surface of the light-transmitting substrate, the surface of the semi-light-shielding pattern, and the surface of the light-shielding pattern. COPYRIGHT: (C)2011,JPO&INPIT