NANO IMPRINT METHOD, PATTERN FORMATION BODY, AND NANO IMPRINT SYSTEM

NANO IMPRINT METHOD, PATTERN FORMATION BODY, AND NANO IMPRINT SYSTEM

PROBLEM TO BE SOLVED: To provide a nano imprint method or the like which reduces defects by suppressing damage to resin when demolding. SOLUTION: A resin layer of electron ray curing resin is formed on a base material. A mold having a rough pattern is made to contact with the resin layer. The electr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ITO KIMIO, HOGEN MORIHISA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a nano imprint method or the like which reduces defects by suppressing damage to resin when demolding. SOLUTION: A resin layer of electron ray curing resin is formed on a base material. A mold having a rough pattern is made to contact with the resin layer. The electron ray is radiated from at least either the base material side or the mold side to cure the resin layer. The resin layer and the mold are then detached from each other. COPYRIGHT: (C)2011,JPO&INPIT