SPECTRAL PURITY FILTER FOR USE IN LITHOGRAPHIC DEVICE

PROBLEM TO BE SOLVED: To provide an improved or alternative spectral purity filter, or a spectral purity filter arrangement. SOLUTION: This spectral purity filter includes a plurality of apertures extending in a member. The apertures are structured to suppress radiation of a first wavelength and all...

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Bibliographische Detailangaben
Hauptverfasser:	SOER WOUTER ANTHON, BANINE VADIM YEVGENYEVICH, JAK MARTIN JACOBUS JOHAN, WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES, YAKUNIN ANDREY MIKHAILOVICH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an improved or alternative spectral purity filter, or a spectral purity filter arrangement. SOLUTION: This spectral purity filter includes a plurality of apertures extending in a member. The apertures are structured to suppress radiation of a first wavelength and allow at least a part of radiation of a second wavelength to permeate the apertures. The radiation of the second wavelength is shorter than the radiation of the first wavelength. The apertures extend in the member in various directions to be substantially aligned with radiation constituting a non-parallel radiation beam. COPYRIGHT: (C)2011,JPO&INPIT