METHOD FOR MOLDING SILICA GLASS CONTAINING TiO2

PROBLEM TO BE SOLVED: To provide a method for molding silica glass containing TiO2, in which such a problem as Ti2O3(III) caused by the use of a graphite-made molding vessel or entrainment of bubbles is solved. SOLUTION: The method for molding silica glass containing TiO2comprises: a step of disposi...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOIKE AKIO, KAWAGISHI MASAHIRO, MITSUMORI TAKAHIRO, IWAHASHI KOSHIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for molding silica glass containing TiO2, in which such a problem as Ti2O3(III) caused by the use of a graphite-made molding vessel or entrainment of bubbles is solved. SOLUTION: The method for molding silica glass containing TiO2comprises: a step of disposing the silica glass containing TiO2in the molding vessel; and a molding step of molding the silica glass containing TiO2in the molding vessel in an inactive atmosphere at ≥1,500°C. A molding having a desired shape is obtained by performing the molding step two times or more. After the molding step is performed and before the next molding step is performed, a grinding step of grinding at least one surface of the silica glass containing TiO2is performed at least once. COPYRIGHT: (C)2011,JPO&INPIT