POLISHING CLOTH
PROBLEM TO BE SOLVED: To provide a polishing cloth having a superior water absorbing property, capable of suppressing scratches and the like during polishing, and especially being suitable for high precision polishing. SOLUTION: The polishing cloth is made from polyamide 56 of which 90 mol% or more...
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| creator | HORIGUCHI TOMOYUKI NONAKA SHUICHI |
| description | PROBLEM TO BE SOLVED: To provide a polishing cloth having a superior water absorbing property, capable of suppressing scratches and the like during polishing, and especially being suitable for high precision polishing. SOLUTION: The polishing cloth is made from polyamide 56 of which 90 mol% or more of a repeating unit is structured in a pentamethylene adipamide unit, and which is 3-8 in sulfuric acid relative viscosity and 1.5-3 in a degree of dispersion (Mw/Mn) of molecular weight. The polishing cloth is made of a sheet-shaped article having polyamide 56 fibers which is 4-11 cN/dtex in tensile strength. COPYRIGHT: (C)2011,JPO&INPIT |
| format | Patent |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | POLISHING CLOTH |
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