POLISHING CLOTH

PROBLEM TO BE SOLVED: To provide a polishing cloth having a superior water absorbing property, capable of suppressing scratches and the like during polishing, and especially being suitable for high precision polishing. SOLUTION: The polishing cloth is made from polyamide 56 of which 90 mol% or more...

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Bibliographische Detailangaben
Hauptverfasser:	HORIGUCHI TOMOYUKI, NONAKA SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polishing cloth having a superior water absorbing property, capable of suppressing scratches and the like during polishing, and especially being suitable for high precision polishing. SOLUTION: The polishing cloth is made from polyamide 56 of which 90 mol% or more of a repeating unit is structured in a pentamethylene adipamide unit, and which is 3-8 in sulfuric acid relative viscosity and 1.5-3 in a degree of dispersion (Mw/Mn) of molecular weight. The polishing cloth is made of a sheet-shaped article having polyamide 56 fibers which is 4-11 cN/dtex in tensile strength. COPYRIGHT: (C)2011,JPO&INPIT