DIP APPLICATION APPARATUS

PROBLEM TO BE SOLVED: To provide a dip application apparatus which forms an application film efficiently on an application object body while suppressing uneven application or application defects. SOLUTION: The dip application apparatus includes: an application tank 10; an application liquid supply p...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: MATSUO RIKIYA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a dip application apparatus which forms an application film efficiently on an application object body while suppressing uneven application or application defects. SOLUTION: The dip application apparatus includes: an application tank 10; an application liquid supply part 20 for supplying an application liquid L to the application tank 10 so that the application liquid overflows the application tank 10; an application liquid recovery part 30 for recovering the overflowing application liquid L; and a circulation path 40 which connects the application liquid recovery part 30 to the application liquid supply part 20 to circulate the application liquid L. The application liquid supply part 20 includes: an application liquid tank 21 which is connected to the circulation path 40 and used for storing the application liquid L; a liquid supply path 22 through which the application liquid L is supplied from the application liquid tank 21 to the application tank 10; a pump 23 which is arranged in the liquid supply path 22 and used for supplying the application liquid L from the application liquid tank 21 to the application tank 10; a pressure detector 24 for detecting the discharge pressure of the pump 23; and a series route part 27 provided downstream from the pressure detector 24 in the liquid supply path 22 and formed by arranging a filter 25 and a flow rate regulating valve 26 in this order. COPYRIGHT: (C)2011,JPO&INPIT