METHOD OF CONTROLLING EXPOSURE APPARATUS
PROBLEM TO BE SOLVED: To provide a method for controlling an exposure apparatus, by which a recipe (parameter file) can be prepared without requiring an operator to approach an exposure apparatus in a clean room, and thereby, the prepared recipe can be efficiently and easily used without errors. SOL...
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| creator | NISHIKAWA TAKAHIRO NAGAI KAZUMA HASEGAWA KAZUYA |
| description | PROBLEM TO BE SOLVED: To provide a method for controlling an exposure apparatus, by which a recipe (parameter file) can be prepared without requiring an operator to approach an exposure apparatus in a clean room, and thereby, the prepared recipe can be efficiently and easily used without errors. SOLUTION: The apparatus information 110 of an exposure apparatus is preliminarily stored in a computer 100, which is placed away from the exposure apparatus 1. The information 130 of a mask and of a substrate to be used is input to the computer, and a recipe 120 for carrying out an exposure operation is prepared by the computer by referring the apparatus information. The recipe is stored in a memory 6 inside a controller 5 of the exposure apparatus through a portable storage medium 200 or through a data transfer path. COPYRIGHT: (C)2011,JPO&INPIT |
| format | Patent |
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SOLUTION: The apparatus information 110 of an exposure apparatus is preliminarily stored in a computer 100, which is placed away from the exposure apparatus 1. The information 130 of a mask and of a substrate to be used is input to the computer, and a recipe 120 for carrying out an exposure operation is prepared by the computer by referring the apparatus information. The recipe is stored in a memory 6 inside a controller 5 of the exposure apparatus through a portable storage medium 200 or through a data transfer path. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | METHOD OF CONTROLLING EXPOSURE APPARATUS |
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