METHOD OF CONTROLLING EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a method for controlling an exposure apparatus, by which a recipe (parameter file) can be prepared without requiring an operator to approach an exposure apparatus in a clean room, and thereby, the prepared recipe can be efficiently and easily used without errors. SOL...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NISHIKAWA TAKAHIRO, NAGAI KAZUMA, HASEGAWA KAZUYA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for controlling an exposure apparatus, by which a recipe (parameter file) can be prepared without requiring an operator to approach an exposure apparatus in a clean room, and thereby, the prepared recipe can be efficiently and easily used without errors. SOLUTION: The apparatus information 110 of an exposure apparatus is preliminarily stored in a computer 100, which is placed away from the exposure apparatus 1. The information 130 of a mask and of a substrate to be used is input to the computer, and a recipe 120 for carrying out an exposure operation is prepared by the computer by referring the apparatus information. The recipe is stored in a memory 6 inside a controller 5 of the exposure apparatus through a portable storage medium 200 or through a data transfer path. COPYRIGHT: (C)2011,JPO&INPIT