MOLDING METHOD FOR SILICA GLASS CONTAINING TIO2

PROBLEM TO BE SOLVED: To provide a molding method for silica glass containing TiO2that is free of internal foreign matter and bubbles caught therein which are caused by using a molding vessel made of graphite. SOLUTION: The molding method for titania-doped quartz glass is characterized by including...

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Hauptverfasser:	KOIKE AKIO, OGAWA TOMOTAKA, KAWAGISHI MASAHIRO, MITSUMORI TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a molding method for silica glass containing TiO2that is free of internal foreign matter and bubbles caught therein which are caused by using a molding vessel made of graphite. SOLUTION: The molding method for titania-doped quartz glass is characterized by including the following steps:a suspension containing SiO2particles is applied to at least either one of the inner surface of the molding vessel made of graphite and the surface of the silica glass containing TiO2to be loaded in the molding vessel; and subsequently the silica glass containing TiO2is loaded in the molding vessel made of graphite and molded at 1,500°C or higher under an inert gas atmosphere to obtain a molded object of an optional shape. COPYRIGHT: (C)2011,JPO&INPIT