LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To reduce defects caused by using an immersion liquid in an immersion liquid lithographic apparatus.SOLUTION: The lithographic apparatus includes: a support configured to support a patterning device, where the patterning device can impart a radiation beam with a pattern in its cross-section, to form a patterned radiation beam; a substrate table configured to hold a substrate; a liquid supply system configured to provide a liquid to a local area of a top surface of a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate through the liquid. The lithographic apparatus is configured to coordinate movement of the substrate table and the support during imaging of a line of dies across the substrate and this is accomplished by movement of the line of dies under the projection system backwards and/or forwards only in a direction substantially parallel to a first direction, where the first direction is in a plane substantially parallel to the top surface.