LITHOGRAPHIC PROJECTION APPARATUS

PROBLEM TO BE SOLVED: To provide a lithography apparatus that reduces or removes insulation collapse and has an electrical connector suitable for low-pressure, high-voltage electric connection.SOLUTION: The lithographic projection apparatus is configured to transfer a pattern onto a substrate. The l...

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Bibliographische Detailangaben
Hauptverfasser:	SIJBEN ANKO JOZEF CORNELUS, JEROEN-FRANK DEKKERS, DAMEN JOHANNES WILHELMUS, VAN GOMPEL PETRUS ALBERTUS JOHANNES FRANCISCA, BRINKHOF EUGENE MARIA, ROZENVELD JOHANNES ALBERT, LANGELER HERMANUS ANTONIUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithography apparatus that reduces or removes insulation collapse and has an electrical connector suitable for low-pressure, high-voltage electric connection.SOLUTION: The lithographic projection apparatus is configured to transfer a pattern onto a substrate. The lithography apparatus includes a power source and the electrical connector. The electrical connector electrically connects the power source to another component of the lithography device. The electrical connector includes a laminate sequentially including: a first conductive layer 37; a first flexible insulating layer 36; a conductor 33 configured to carry a current; a second flexible insulating layer 36; and a second conductive layer 37.