SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS

PROBLEM TO BE SOLVED: To provide a solid-state imaging device suppressed in sensitivity irregularity and shading, and to provide an electronic apparatus using the same.SOLUTION: The solid-state imaging device is composed by including a substrate 19, pixels 2 formed on the substrate 19, and a multistage element isolation layer 31 for isolating the adjacent pixels from one another. The pixel 2 is formed by including a light reception part 12 for generating and storing signal charge in response to incident light, and a pixel electrode 14 formed on the substrate 19. The multistage element isolation layer 31 is formed by including a plurality of stages of impurity diffusion layers. A multistage element isolation region 31 formed in a depth direction from a substrate surface in a region facing the pixel electrode 14 by interposing the light reception part 12 includes lower-stage element isolation layers 24, 25 formed away from the light reception part 12 by a predetermined distance W1 in a deeper region than 0.5-1 μm from a light-incident surface of the substrate 19.