SELF-ORGANIZING PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To properly and quickly form a self-organizing pattern.SOLUTION: A neutralization film 102 is formed on a substrate 101, and a guide pattern 103 having hydrophilicity and an opening 103a is formed on the neutralization film 102. Then, a hydro-treatment which is a surface treatment to increase the hydrophilicity of the guide pattern 103 is performed on at least a side surface of the guide pattern 103. Then, a block copolymer film 105 is formed on the neutralization film 102 at the opening of the surface-treated guide pattern 103. Then, the block copolymer film 105 is annealed to be self-organized. Then, a second pattern 105b, which is a self-organizing pattern, is formed from the self-organized block copolymer film 105.